If LNEYA multi channel chillers do not meet your application
we can tailor a suitable solution for you.
Contact LNEYA
Submit your request to us and we will contact you within 24 hours
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Dual channel chiller or Three channel chiller for semiconductor industry
Temp range -45℃~90℃ Temp accuracy ±0.05℃
FLTZ multi channel chiller can realize multi-channel independent temperature control. We can set the same or different temperature range, heat transfer medium flow rate, etc. for each channel according to your needs.
The channels do not affect each other. Even if one channel fails, it will not affect the operation of other channels.
LNEYA is a leading manufacturer of multi channel chillers in China, specializing in precise temperature control (±0.1℃). Since 2010, we have been a trusted chiller supplier for companies across various industries.
Multi channel semicondcutor chillers
Our FLTZ multi channel chiller lineup includes standard dual-channel and three-channel models. For specialized applications, we offer custom solutions tailored to your specific needs, including channel count, control parameters, and equipment size.
Contact our industrial chiller sales team to request a standard product catalog or customize a process chiller.
Multi-channel Chiller‘s Applications
FLTZ multi-channel chillers are widely used in the semiconductor industry due to their advantages such as precise temperature control, independent circuit management, and rapid cooling. The application scenarios of semiconductor chillers include wafer manufacturing, packaging testing, photolithography, etching, CVD/PVD deposition, cleaning processes, etc.
The high-energy particle beam generated during ion implantation can cause local high temperatures. The process chiller can quickly remove heat to prevent thermal damage to the wafer.
During plasma etching (RIE, ICP, etc.), the chamber and electrodes need to be strictly temperature controlled to ensure etching uniformity. The chiller can provide a stable temperature environment for etching equipment and reduce process deviations
In the packaging process of BGA, CSP, FCBGA, etc., the temperature control of welding and packaging materials affects reliability
CVD (such as LPCVD, PECVD) and PVD (such as sputtering coating) are used for thin film deposition, and the temperature control of the chamber and substrate affects the quality of the film.
The exposure system, optical lenses, laser light sources, and mask plates of the photolithography machine require precise temperature control to ensure pattern accuracy.
Used to help maintain deionized water within a specific temperature range to remove photoresist residues, metal contamination and particulate matter.
Why do you need FLTZ multi channel chillers?
Why Choose LNEYA?
With the help of the Internet, we have built a global consulting, sales and service network. We have served more than 30,000 customers worldwide and have more than 90 patents.
Our chillers have been selected by more than 100 university laboratory projects around the world and exported to more than 20 countries. We have agents in various European countries and regions such as Singapore, Malaysia, Japan, South Korea, Qatar, Middle Eastern countries, Australia, the Netherlands, Spain and the United States.
If LNEYA multi channel chillers do not meet your application
we can tailor a suitable solution for you.
Contact LNEYA
Submit your request to us and we will contact you within 24 hours
WeChat/Phone
86 18914253067
86 13912479193
Email Address
sales@cnzlj.com