Semiconductor
Fast/Stable/Constant Temperature
Precise temperature control of many processes in semiconductor production. Apply extremely thin layers, partially mask, and remove uncovered parts with absolute precision in an almost unlimited number of individual steps. Etching baths must be kept within an optimum temperature range to keep etch rates constant and predictable in wet chemical processes. This requires the use of absolutely precise and reliable temperature control solutions.
Temperature control of etch baths for wet chemical fabrication of wafers and microchips. Further applications are functional and material testing of electrical and electronic components and functional groups using non-conductive thermal fluids such as Galden or FC77. A perfectly balanced temperature control system not only improves production results, but also increases process reliability and reduces production time, costs and maintenance.

TES-NM65NT |
With Test Chamber |
Temperature control range: -60℃~200℃
Heating Power: 5.5kW
Cooling Power: 1.2kW~5.5kW
Power MAX: 12kW
Types: Water-cooled Chillers / Air-cooled Chillers

SUNDI-15W |
For Chip Testing |
Temperature control range: -100℃~200℃
Heating Power: 5.5kW
Cooling Power: 1.2kW~5.5kW
Power MAX: 12kW
Types: Air-cooled Chillers
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LTS -20℃~80℃
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It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer med…
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LTS -40℃~80℃
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It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer…
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LTS -60℃~80℃
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It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer med…
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