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Semiconductor diffusion furnace configuration temperature control equipment

Gas phase diffusion requires precise control of the concentration, temperature, and time of the diffusion gas to ensure the accuracy and uniformity of doping. Diffusion furnaces are usually equipped with temperature control systems, gas flow control systems, and diffusion control systems to achieve precise control of the diffusion process.

The diffusion furnace equipment usually consists of four main parts: heating chamber, atmosphere control system, temperature control system, and control system. Temperature control system: The temperature control system is used to precisely control the temperature of the heating chamber. Usually, methods such as thermocouples or radiation heaters are used to measure and regulate temperature. Control system: Diffusion furnace equipment is usually equipped with a control system to automatically control various parameters of the diffusion process, such as temperature, time, flow rate, etc. The control system can choose a human-machine interface, making operation more convenient and intuitive.

Diffusion furnaces are widely used in semiconductor processes, including the manufacturing of transistors, diodes, and solar cells. In addition, diffusion furnaces are also applied in fields such as glass industry and ceramic industry.

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